Research on Oxidation Behavior of CP Titanium TA2
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摘要: 研究了工业纯钛TA2在650~1 000℃的氧化行为。结果表明:低于800℃,氧化比较平缓,氧化6 h氧化膜未有脱落现象。高于800℃,则氧化比较剧烈;超过30 min,氧化膜就剥脱。氧化层结构由氧化层与氧扩散层组成,氧化层为钛的多种氧化物组成的混合物,呈多孔状,性脆易脱落;而氧扩散层为氧溶入钛的固溶体,性脆,与基体结合比较紧密,不易剥落。XRD分析表明氧化层的物相主要为TiO2以及TiO0.325、TiO0.48等低价的钛氧化物。Abstract: Oxidation behavior of commercial titanium TA2 was investigated at various atmosphere temperatures ranging from 650℃ to 1 000℃.The results show that oxidation rate was low at temperature below 800℃, and no peeling of oxide film was observed even holding for 6 hours.However, when atmosphere temperature exceeded 800℃ the oxidation tends to be aggressive, oxide film was found breaking off after oxidation for 30 minutes.SEM observation indicated that oxide layer composed of an oxide film and an oxide-rich layer.The oxide film is a mixture structure by several types of titanium oxides which are porous, brittle and readily break off, while the oxide-rich layer is a solid solution where oxygen atoms dissolved into titanium matrix.This oxide-rich layer is brittle but closely adhered to matrix and creates challenges for breaking down.XRD analysis pointed out that phase structure of oxide layer mainly contains TiO2, TiO0.325 and TiO0.48.
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Key words:
- commercial titanium /
- TA2 /
- oxidation /
- oxide-rich layer
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