Microstructure evolution of Ti-Ni series titanium alloy foil during annealing
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摘要: 对厚度为0.15 mm Ti-Ni系钛合金箔材进行不同条件下的退火处理，利用电子背散射衍射技术(EBSD)系统研究了该箔材在不同退火条件下的微观组织及织构演变。结果表明，Ti-Ni系钛合金箔材等温退火时，随着退火时间的延长，再结晶分数提高，形成等轴无畸变的再结晶组织，基面ND织构消失，双峰织构随退火时间的延长，由TD向ND方向靠近；等时退火时，退火温度为500 ℃时，已基本完成再结晶，随着退火温度的升高，再结晶晶粒长大。织构组分不随退火温度的升高而发生改变，织构强度随退火温度的升高而发生改变。Abstract: The 0.15 mm Ti-Ni alloyed titanium foil was annealed under different conditions, and its microstructure and texture evolution after annealing were systematically studied by Electron Backscatter Diffraction (EBSD). The results show that when the titanium alloy foil is isothermally annealed, with the prolongation of annealing time, the recrystallization fraction increases and an equiaxed and undistorted recrystallized structure appears, while the basal ND texture disappears and the bimodal texture approaches from TD to ND. During isochronous annealing, the recrystallization was basically completed when the annealing temperature was 500 ℃, and the recrystallized grains grew as the annealing temperature increased. The texture components was independent of annealing temperature, however, the texture strength changed with the increase of the annealing temperature.
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Key words:
- Ti-Ni series titanium alloy /
- foil /
- cold rolling /
- annealing /
- recrystallization /
- texture /
- electron backscatter diffraction
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图 1 0.15 mmTi-Ni系钛合金箔材初始组织
Figure 1. Initial microstructure of 0.15 mm Ti-Ni alloyed titanium foil
图 2 等温退火过程中的(a)-(d)取向分布和(e)-(h)带衬度图
Figure 2. (a)-(d) Inverse pole figure map and (e)-(h) band contrast map of titanium foil obtained after isothermal annealing
图 3 等温退火过程中的取向差角
Figure 3. The misorientation angle distribution of titanium foil obtained after isothermal annealing
图 4 等温退火过程中的织构演变
Figure 4. Texture evolution of titanium foil obtained after isothermal annealing
图 5 不同退火温度下微观组织演变
Figure 5. Microstructure evolution of titanium foil obtained after annealing at different temperatures
图 6 等时差温退火条件下的取向差角
Figure 6. Misorientation angle distribution of titanium foil obtained under isochronous temperature annealing condition
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