Structure and Properties of TiN Thin Film Deposited on Stainless Steel Surface by Sputtering

The titanium nitride（TiN） thin film was prepared by direct current reactive magnetron sputtering on the surface of stainless steel.The rate of mass increase,microstructure,morphology and microhardness of the film were studied by analytical balance,SEM,XRD and microhardness tester.It is found that with the increase of sputtering time,both of the quality and thickness of the film are increased.XRD analysis shows that the TiN film has a face-centered cubic structure.The TiN film has a preferred orientation.With the increase of sputtering time,the preferred orientation changes from mixed crystal to（111）.The microhardness increases with the increase of sputtering time.