Studying the Electrochemical Deposition of Manganese on the Surface of TiO2 Nanotube Array by Orthogonal Test
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摘要: 用阳极氧化法在钛片表面制备空白TiO2纳米管阵列,用电化学阴极还原法在其表面沉积锰,通过正交试验考察沉积条件对锰修饰TiO2纳米管阵列光电响应的影响。结果表明,锰的表面修饰可以增强TiO2纳米管阵列对可见光的响应,在0.5 V(vs.SCE)的偏电压下,光电流显著增大。沉积时间和沉积电压是影响锰沉积的主要因素,锰沉积的最佳条件为:沉积时间30 s、电压-2 V、锰离子浓度10 mmol/L。Abstract: TiO2 nanotube array(TNA) was prepared by electrochemically anodizing titanium sheet.Metal manganese was deposited on the surface of TNA by electrochemical reduction to enhance its photoelectrochemical response to visible light.The influences of deposition voltage,time and concentration of Mn(II) ion were investigated by orthogonal test.The results show that the surface modification of manganese on TNA can increase its visible light response,and the photoelectrochemical current is obviously enhanced at a biasing voltage of 0.5 V(vs.SCE).The results from orthogonal test indicate that the deposition time and voltage are the key factors to influence the performance of manganese modified TNA.The optimal conditions for manganese deposition can be summarized as follows:deposition time is 30 s,voltage is -2 V,and the concentration of Mn(II) ion is 10 mmol/L.
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