Structure and Properties of TiN Thin Film Deposited on Stainless Steel Surface by Sputtering
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摘要: 采用直流反应磁控溅射法，通过改变溅射时间在不锈钢表面溅射氮化钛薄膜。采用分析天平、SEM、XRD和显微硬度计等对薄膜的质量增加率、微观结构、外观形貌和显微硬度进行研究。结果发现随着溅射时间增加，薄膜的质量增大，厚度逐渐增加。XRD分析表明，TiN薄膜晶体结构为面心立方结构。溅射沉积氮化钛膜具有择优取向性：随溅射时间增加，由混合晶面生长向（111）择优取向变化；随着溅射时间增加，显微硬度总体呈上升的趋势。Abstract: The titanium nitride（TiN） thin film was prepared by direct current reactive magnetron sputtering on the surface of stainless steel.The rate of mass increase,microstructure,morphology and microhardness of the film were studied by analytical balance,SEM,XRD and microhardness tester.It is found that with the increase of sputtering time,both of the quality and thickness of the film are increased.XRD analysis shows that the TiN film has a face-centered cubic structure.The TiN film has a preferred orientation.With the increase of sputtering time,the preferred orientation changes from mixed crystal to（111）.The microhardness increases with the increase of sputtering time.
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Key words:
- Ni-free 201 stainless steel /
- magnetron sputtering /
- titanium nitride /
- film /
- preferred orientation /
- microhardness
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